Record Details
Conduction processes in metal–insulator–metal diodes with Ta₂O₅ and Nb₂O₅ insulators deposited by atomic layer deposition
ScholarsArchive at Oregon State University
| Field | Value |
|---|---|
| Title | Conduction processes in metal–insulator–metal diodes with Ta₂O₅ and Nb₂O₅ insulators deposited by atomic layer deposition |
| Names |
Alimardani, Nasir
(creator) McGlone, John M. (creator) Wager, John F. (creator) Conley, John F., Jr. (creator) |
| Date Issued | 2013-12-13 (iso8601) |
| Note | This is the publisher’s final pdf. The article is copyrighted by the American Vacuum Society and published by the American Institute of Physics Publishing. It can be found at: http://scitation.aip.org/content/avs/journal/jvsta. |
| Abstract | See article for Abstract. |
| Genre | Article |
| Identifier | Alimardani, N., McGlone, J. M., Wager, J. F., & Conley Jr, J. F. (2013). Conduction processes in metal–insulator–metal diodes with Ta₂O₅ and Nb₂O₅ insulators deposited by atomic layer deposition. Journal of Vacuum Science & Technology A, 32(1), 01A122. doi:10.1116/1.4843555 |
