Record Details

Field-effect transistor noise at low temperatures

ScholarsArchive at Oregon State University

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Title Field-effect transistor noise at low temperatures
Names Spaulding, Richard Alan (creator)
Looney, James C. (advisor)
Date Issued 1968-08-16 (iso8601)
Note Graduation date: 1969
Abstract Low temperature noise measurements on junction field-effect
transistors tend to substantiate a theory of low frequency field-effect
transistor noise based on the presence of generation centers in the
gate-channel depletion region. Measurements of device noise voltage
versus temperature reveal pronounced maxima and minima over the
temperature range of 300° K to 77° K. Analysis of the maxima can
yield information on time constants, capture cross-sections and energy
levels of generation centers in the depletion region.
The pertinent theories of junction FET noise are reviewed with
regard to temperature-dependent phenomena. Contributions due to
thermal noise, shot noise, induced gate noise, surface leakage and
generation centers are considered.
Techniques for measuring the temperature dependence of FET
noise are discussed, and a practical approach is described.
Measurements are made in a typical circuit configuration in order
that the results may be directly related to device applications.
Measured data on the temperature dependence of noise in the
300° K to 77°K range is presented for 14 n- and p-channel FET's.
Salient features of the data are analyzed and correlated with theoretical
predictions.
Genre Thesis/Dissertation
Topic Transistors -- Noise
Identifier http://hdl.handle.net/1957/46548

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